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Effect of secondary annealing process on critical current density in highly textured Bi-2212 superconducting system

机译：二次退火工艺对高织构化Bi-2212超导系统中临界电流密度的影响

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Bi-2212 samples prepared by a solid-state reaction technique have been grown from the melt using the laser floating zone method. After annealing the as-grown bars, the samples showed a good grain alignment and a high transport critical current density. Secondary annealing processes were performed on the annealed samples with the aim of producing Bi-2212 phase controlled decomposition. Hence, the Bi-2201 phase and the secondary phases, which act as effective pinning centers, were obtained with the secondary annealing process. After these thermal treatments, the transport critical current densities of samples significantly increased, when compared to the annealed ones. The maximum critical current density was achieved when the samples were subjected to secondary annealing at 680°C for 168 h with an improvement of ~80%, compared to the annealed ones. Moreover, it was found that magnetization of the secondarily annealed samples was also increased. The magnetic critical current densities in these secondary annealed samples were about 3 times higher than the values obtained for the annealed ones. These results clearly indicate that the secondary annealing processes lead to the formation of effective pinning centers in the bulk material.
机译：使用激光浮区法从熔体中生长了通过固态反应技术制备的Bi-2212样品。将生长后的棒退火后，样品显示出良好的晶粒排列和高的传输临界电流密度。为了产生Bi-2212相控分解，对退火后的样品进行了二次退火处理。因此，通过二次退火工艺获得了Bi-2201相和充当有效钉扎中心的第二相。经过这些热处理后，与退火后的样品相比，样品的运输临界电流密度显着增加。与退火后的样品相比，当样品在680°C下进行二次退火168h时达到了最大临界电流密度，提高了约80％。此外，发现二次退火样品的磁化也增加了。这些二次退火样品中的磁临界电流密度大约是退火样品的3倍。这些结果清楚地表明，二次退火过程导致在散装材料中形成有效的钉扎中心。

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